污染控制
Contamination Control
手段Ⅰ
Facilities I

1、 地板风速测量来检验洁净室气流的平行性
    Clean Space Airflow Parallelism Verification from Floor Velocity
    Measurements
    米切尔^.居 Michael D. Jue

2、 用通风效率评估法对"前开式洁净容器"（FOUP）系统的洁净室内气流特性进行
    的研究
    A Study on the Airflow Performance in Cleanrooms with "FOUP" Systems
    by Using an Evaluation Method for Ventilation Efficiency
    高桥尾谷Yoshihide Suwa

3、 开发简化步骤，测量室内空气分布
    Development of Simplified Measuring Procedure for Indoor Age-of -Air     Distributions
    佐藤多一、高桥尾谷、藤本壮一 Satoru Doi, Yoshihide Suwa, and Shigeru
     Sakamoto

4、 国家核聚变研究设施粒子束通道及动力系统的洁净建造约定
    Clean Construction Protocol for the National Ignition Facility
    Beampath and Utilities
    斯坦利^.索马，艾明^.斯道尔，大卫^.万德文，罗伯特^.普瑞茅，苏^.史帝文森
     Stanley C. Sommer, Irving F.Stowers, David E. Van Doren, Robert A.
     Predmore, and Sue A. Stephenson

5、 洁净室气流层控制
    Cleanroom Airflow Laminarity Controls
    乔治o汀诺雷 George Ting-Kwo Lei

洁净室运行Ⅰ
Cleanroom Operations I

6、 使用小型NO2仪表分析洁净室空气
    Analysis in Clean Room Air Using Small NO2 Meter
    古村合志、上原敬二、筱冢功、节部园实、鹤信二、佐佐木茂园、数本则园     Atsushi Komura,Keiji Uehara, Isao Shinozuka, Sonomi Kushibe,
    Shinji Tsuru, Shigekuni Sasaki, and Norikuni Yabumoto 

7、 对排放气流时间变化的评估
    Estimate of Time Change of the Gas Emission Flux
    田村启、藤井秀二、钩直木 Hajime Tamura, Shuji Fujii, and Naoki Kagi 

8、 开发超声提取法评估静电强化颗粒沉淀式晶片存储箱的洁净度
    Development of an Ultrasonic Extraction Method of Evaluate the
    Cleanliness of Wafer Storage Boxes Prepared by Electrostatically
    Enhanced Particle Deposition
    王华平，柯克^.米克森，刘本加明 Huaping Wang, Kirk Mikkelsen, and
    Benjamin Y. H. Liu

9、 高浓度颗粒环境下的取样
    Sampling High Concentration Ambient Particles
    纳康^.特培王，纳特^.瓦瑞斯，苏加^.苏克迈，阿拉克^.李 Nakorn Tippayawong,
    Nat Vorayos, Sujja Suksamai, and Aleck Lee

悬浮分子污染 Ⅰ
Airborne Molecular Contamination I

10、使用温度压力箱对卫星部件进行气体释放试验
    Outgassing Experiment on a Satellite Component Using Bake-Out Chamber
    朴贵文、蔡索文、何均索、李醒宏、李东金、李星汉 Guee-Won Moon, Seok-
    Weon Choi,Hee-Jun Seo, Sang-Hoon Lee, Dong-Jin Lee, and Sang-Seol Lee

11、洁净室空气中酸性和碱性化合物在硅晶片表面的沾附特性
    Sticking Behavior of Acidic and Basic Compounds in Clean Room Air
    onto Silicon Wafer Surface
    桃来加奈、武田菊男、饭川伶子、尾川纪子、今井谆、藤本武利
    Kana Momoji, Kikuo Takeda,Reiko Likawa, Noriko Ohkawa, Makoto Imai,
    and Taketoshi Fujimoto

12、建筑材料以其内部特性散发挥发性有机化合物的机理
    VOC Emission Mechanisms from Building Materials by Considering
    International Behavior
    钩直木、藤井秀二、田村启 Naoki Kagi, Shuji Fujii, and Hajime Tamura

13、以分子模拟化学污染物的吸收特性
    Adsorption Behavior of Chemical Contaminants by Molecular Simulation
    悟堂正纯、武志全司、友成睦地、三浦国尾、高见知志、久保百治、宫本明荣
    Masazumi Godo,Takeshi Takatsuka, Mutsuya Tomonari, Kunio Miura,
    Seiichi Takami, Momoji Kubo, andAkira Miyamoto

14、使用温控石英微量计（TQCM）对洁净室的分子污染进行长期测量
    Long-Term Measurement of Molecular Contamination in a Cleanroom Using
    a Temperature-Controlled Quartz Crystal Microbalance (TQCM)
    威廉姆^.米切尔 William J. Moitchell